Microstructure,Mechanical and Friction Properties of TiAlN/VN Multilayer Films with Different Modulation Periods
In order to study the effect of modulation period on the structure and properties of TiAlN/VN nanostructured multilayer films,a series of TiAlN/VN nanostructured multilayer films with different modulation periods were prepared by RF magnetron sputtering.The phase structure,cross-sectional morphology,hardness and tribological properties of the films were characterized by X-ray diffraction(XRD),field emission scanning e-lectron microscopy(SEM),nanoindentation and friction and wear tester,respectively.The results show that TiAlN/VN multilayers always preferentially grow along(111)plane.With the increase of the modulation period,the hardness of the multilayer film increases first and then decreases.When the modulation period is 6 nm,the hardness of the multilayer film is the highest,which is 33.12 GPa.is considered that the alternating stress field caused by lattice mismatch is the reason for the"superhard effect"of the multilayer film.At room temperature,the average friction coefficient of the multilayer film is the smallest when the modulation period is 6 nm,which is 0.362 8.At 635 ℃,the average friction coefficient of the multilayer film corresponding to the modulation period of 8 nm is the smallest,which is 0.248 5.
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