为了得到能够呈现出合理电致变色性能的Bi2O3薄膜,需要筛选其膜厚.通过磁控溅射法制备得到厚度为20～300 nm的Bi2O3薄膜,并利用UH4150紫外可见(ultraviolet-visible,UV-Vis)分光光度计和CHI-660e电化学工作站测试薄膜的电致变色性能.采用扫描电子显微镜(scanning electron microscope,SEM)和 X 射线衍射仪(X-ray diffraction,XRD)分别检测了薄膜的表面形貌和物相结构.对变色对比度(△Tλ=550nm)、电致变色效率(η)以及性能保留度(R△T、Rη)的表现进行综合甄别,发现膜厚介于60～120 nm之间的Bi2O3薄膜的△T和η分别达到25％和10 cm2/C,并且具有较高的电致变色性能保留度(R△T=20％、Rη=44.6％).这可能与该厚度区间薄膜的主要物相为具有较高离子导电性的δ相有关.
Abstract
It is necessary to select appropriate thickness for the fabrication of Bi2O3 thin films with reasonable electrochromic properties.Bi2O3 thin films with an approx-imate range of 20～300nm in thickness were prepared by magnetron sputtering.The electrochromic properties of the films were analyzed by using ultraviolet-visible(UV-Vis)spectrophotometry and an electrochemical workstation.The surface morphology and phase structure of the thin films were investigated by scanning electron microscope(SEM)and X-ray diffraction(XRD).After comprehensive screening to assess their performance in terms of the color change contrast(△Tλ=550 nm),electrochromic efficiency(η),and performance retention(R△T,Rη),the values of △T and η of Bi2O3 thin films with a thickness between 60 nm and 120 nm were found to reach 25％and 10 cm2/C,respectively.Furthermore,the retention of the electrochromic properties(R△T=20％,Rη=44.6％)is high.This may be related to the fact that the main phase of the film in this thickness range is δ,which is characterized by high ionic conductivity.
关键词
膜厚/氧化铋/电致变色/薄膜
Key words
film thickness/bismuth oxide/electrochromism/thin film
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