In this paper,the high resolution inductively coupled plasma mass spectrometeris used to detect metal impurities in silicon oxide polishing liquid.By adjusting element resolution and selecting suitable isotope for detection,the problem of mass spectrum interference can be effectively solved.The standard addition method was used to dilute the samples for the detection of metal impurities,and the recovery rate of 10 μg/kg was between 81.17%and 111.79%,which can realize the rapid analysis of metal impurities in silica slurry.
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