Research of photosensitive antibacterial agents and their application progress in textile materials
Textile materials,especially clothing in close contact with the skin,provide a foundation for the transfer of microorganisms from human skin to textiles.Similarly,external microorganisms can also transfer to the skin surface by adhering to the textile materials,causing skin inflammation,infection or allergic reactions.Additionally,the growth of microorganisms on textiles can damage the fiber structure or dyes,resulting in a decline in strength,color fastness or appearance quality.Microorganisms can also decompose sweat,oils or other organic substances on textiles,leading to unpleasant odors.Therefore,antimicrobial textiles have garnered significant attention.Photosensitive antimicrobial agents,due to their low biological toxicity,do not induce microbial resistance during the antimicrobial process.They can effectively deactivate pathogenic microorganisms and serve as an alternative method to antibiotic chemical therapy,with applications in the field of antimicrobial materials.Currently,photosensitive antimicrobial agents encompass a variety of compounds,mainly including porphyrins,heterocyclic anthraquinones,thiophene derivatives,natural photosensitizers,inorganic nano-photosensitive antimicrobials,etc.These agents interact with bacteria,absorb energy from sunlight and ultraviolet light,and subsequently react with oxygen to generate reactive oxygen species that cause oxidative damage to pathogenic microorganisms,eliminating bacteria and fungi effectively.Specifically,porphyrin-based photosensitizers can generate reactive oxygen species by selectively absorbing specific wavelengths of light,thereby killing bacteria and fungi.Bengal rose,an anthraquinone-based photosensitive antibacterial agent,exhibits excellent biocompatibility.When used as a dye,it significantly stains bacterial cells,protozoa and tissues.Thiophene derivatives can produce additional intermediate products,such as singlet oxygen under specific wavelength of light.Importantly,they exhibit minimal toxicity to human normal cells.Photosensitive antimicrobials extracted from plants,fungi and bacteria exhibit strong absorption under visible light and exhibit promising photodynamic effects.Inorganic nano-photosensitive antimicrobial agents can activate nanometer materials by light,and exhibit antibacterial effects.Their unique electronic,physical and morphological properties,as well as the arrangement of core-shell hybrid structures,offer multifunctionality for antimicrobial applications.The incorporation of these photosensitive antimicrobial agents into fiber or textile materials serves multiple purposes.It not only eradicates bacteria and fungi,reduces odors and stains,but also effectively prevents the growth of these microorganisms,thereby maintaining the cleanliness and hygiene of textiles.Currently,the application of photosensitive antibacterial agents on textile materials mainly involves coating method,chemical grafting,electrostatic adsorption,spinning method and so on.Although the coating method is a convenient and quick finishing method,textiles treated with coatings exhibit some photosensitive antimicrobial effects,the stability is often limited and coatings may age or peel off over time.In order to further enhance the durability of photosensitive antibacterial textile materials,chemical grafting is used to covalently bond photosensitizer molecules to textile materials'surface,improving the photosensitive antibacterial stability and durability.Electrostatic adsorption involves the electrostatic interaction between charged fibers and ion-type photosensitizers,which provides an alternative approach to adsorb photosensitizer molecules onto textile surfaces.Additionally,by adding photosensitive antibacterial agents into spinning solutions,a special form of electrospinning using polymer fluid can produce fiber materials with photodynamic antibacterial properties.This straightforward technique effectively generates micro/nano-fiber structures,thereby increasing surface area and light absorption capacity.At present,the application of these photosensitive antimicrobial agents to textile materials still has some limitations.For instance,when bacteria,viruses and other microorganisms adhere to the textile materials'surface,their remnants may persist even after their being killed by photosensitive antimicrobial agents,which can affect both the appearance and odor.Research focused on effective removal methods for these microbial remnants is essential.Furthermore,investigation is necessary to enhance the durability,stability and antimicrobial efficacy of photosensitive antimicrobial textiles,particularly after repeated washing.There are numerous effective and high-performance of photosensitive antibacterial agents.Their bactericidal effects are significant,and the microbial strains do not develop resistance to them.However,further exploration is needed regarding antimicrobial performance,biological safety and stability.When the photosensitive antibacterial agents are loaded onto textile materials to achieve high efficiency antibacterial properties,the problem of microbial remains on the fabric surface after killing should be carefully considered.Striking a balance between sterilization and decontamination to create a clean textile surface is a key focus in the antimicrobial textiles research.By combining materials with different antimicrobial mechanisms,intelligent surfaces which are capable of attracting,binding,and eliminating various pathogens can be created.This innovation surpasses traditional antimicrobial textiles and expands the application field of photosensitive antimicrobial textiles.
万方数据
维普
