Analysis and Improvement of Line Open Defects in Gate Manufacturing Process of Dual Gate LCD
This paper explores the impact of aqueous vapor in the photolithography process and crystallization in the ITO etching process on Gate manufacturing process of Dual Gate products,and proposes effective improvement plans.After the introduction of the optimal improvement conditions,the overall occurrence rate of line open defects in Gate process of the 55"UHD Dual Gate product was reduced by 36%,which gives the company a monthly income of 802000 yuan.It can provide important reference value for the improvement of line open defects in high-end products such as Dual Gate/Triple Gate and the design improvement of new process equipment in the future.
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