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单磨头瓷砖抛光工艺参数对磨削均匀性的影响

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针对瓷砖抛光生产中出现的过抛、漏抛等严重影响产品质量的问题,基于Preston方程和磨头外轮廓轨迹方程,建立了抛光工艺参数和运动参数与过抛、漏抛相关变量间的数学模型.仿真分析结果表明:过抛区域主要集中在抛光轨迹重叠区域,少部分分布在轨迹的上下弧形区域;当改变抛光工艺参数时,随着无漏抛区域宽度变大,重叠区域的面积也随之变大.通过调整抛光工艺参数不仅可在无漏抛区域宽度减少17.91%,还能使得重叠面积减少53.06%,极大改善了过抛情况,有效地提升了磨削均匀性,为后续实际生产中抛光轨迹的优化提供理论基础.
Influence of Single Grinding Head Ceramic Tile Polishing Process Parameters on Grinding Uniformity
This paper was aimed to address the serious issues of over-polishing and under-polishing in the production of ceramic tiles,which significantly affect product quality.Mathematical models were established to correlate polishing process parameters and motion parameters with variables related to over-polishing and under-polishing,based on the Preston equation and the grinding head outer profile trajectory equation.According to the simulation analysis results,it is revealed that over-polishing primarily occurs in the overlapping regions of the polishing trajectory,with a smaller proportion distributed in the upper and lower arc regions of the trajectory.As the polishing process parameters are modified,an increase in the width of the leak-free polishing zone corresponds to an enlargement of the overlapping area.It is possible to reduce the width of the leak-free polishing zone by 17.91%,simultaneously resulting in a 53.06%reduction in the overlapping area,by adjusting the polishing process parameters.This significant improvement effectively enhances the over-polishing situation,markedly promoting grinding uniformity.These findings offer a theoretical foundation for optimizing polishing trajectories in practical production of ceramic tiles.

uniformitypolishing process parametersgrindingPreston equationsimulation analysis

韩文、杨振恒、隋旭东、徐磊、曾时金、于盛睿、徐晗

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景德镇陶瓷大学,江西景德镇 333403

科达制造股份有限公司,广东佛山 528313

均匀性 抛光工艺参数 磨削 Preston方程 仿真分析

景德镇市陶瓷产业重大产学研协同攻关和成果转化项目校企合作项目

2023ZDGC003KD-XMLX-20231244

2024

陶瓷学报
景德镇陶瓷学院

陶瓷学报

CSTPCD北大核心
影响因子:0.7
ISSN:1000-2278
年,卷(期):2024.45(4)
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