首页|One-Step Scalable Fabrication of Nitrogen and Chlorine Co-doped Graphene by Electrochemical Exfoliation for High-Performance Supercapacitors

One-Step Scalable Fabrication of Nitrogen and Chlorine Co-doped Graphene by Electrochemical Exfoliation for High-Performance Supercapacitors

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The stacking and aggregation of graphene nanosheets have been obstacles to their application as electrode materials for micro-electronic devices.This study deploys a one-step,scalable,facile electrochemical exfoliation technique to fabricate nitrogen(N)and chlorine(Cl)co-doped graphene nanosheets(i.e.,N-Cl-G)via the application of constant voltage on graphite in a mixture of 0.1 mol/L H2SO4 and 0.1 mol/L NH4C1 without using dangerous and exhaustive operation.The introduction of Cl(with its large radius)and N,both with high electrical negativity,facilitates the modulation of the electronic structure of graphene and creation of rich structural defects in it.Consequently,in the as-constructed supercapacitors,N-Cl-G exhibits a high specific capacitance of 77 F/g at 0.2 A/g and remarkable cycling stability with 91.7%retention of initial capacitance after 20,000 cycles at 10 A/g.Furthermore,a symmetrical supercapacitor assembled with N-Cl-G as the positive and nega-tive electrodes(denoted as N-Cl-G//N-Cl-G)exhibits an energy density of 3.38 Wh/kg at a power density of 600 W/kg and superior cycling stability with almost no capacitance loss after 5000 cycles at 5 A/g.This study provides a scalable protocol for the facile fabrication of high-performance co-doped graphene as an electrode material candidate for supercapacitors.

GrapheneElectrochemical exfoliationSupercapacitorNitrogenChlorine

Qian Li、Hu Zheng、Binbin Liu、Tianzhen Jian、Wenqing Ma、Caixia Xu、Kai Wang

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Institute for Advanced Interdisciplinary Research(iAIR),School of Chemistry and Chemical Engineering,University of Jinan,Jinan 250022,China

Institute of Electrical Engineering,Chinese Academy of Sciences,Beijing 100190,China

2024

天津大学学报(英文版)
天津大学

天津大学学报(英文版)

EI
影响因子:0.343
ISSN:1006-4982
年,卷(期):2024.30(5)