Influence of the pulsed bias and nitrogen partial pressure on structure and properties of(Zr,Cr)N thin films prepared by multi-arc ion plating
In order to investigate influence of substrate pulsed bias and nitrogen partial pressure on performance of(Zr,Cr)N,its thin films are deposited by multi-arc ion plating,and surface morphology,phase structure,mechanical properties,and wetting properties of the thin film samples were characterized using scanning electron microscopy,atomic force microscopy,X-ray diffractometer,friction tester,and surface performance tester,respectively.The experimental results show that at the fixed substrate bias voltage of-50 V,the surface roughness of the film is the smallest and the wear resistance is the best,with a wear rate of 1.416 7×10-13 m3/(N·m)as the nitrogen partial pressure is adjusted to 0.3 Pa;when the nitrogen partial pressure is 0.5 Pa,the film has the optimized hydrophobicity with a water contact angle of 105.42°.Then the nitrogen par-tial pressure is kept constant at 0.5 Pa and the various bias voltages are applied to the substrate to deposit the films.It is found that the surface roughness of the thin films decreased with the increasing bias voltage,and the friction and wear per-formance is improved.When the bias voltage is increased to-250 V,the contact angle reaches at the maximum value of 106.88°,indicating that the thin film has the optimized hydrophobic performance.
multi-arc ion platingnitrogen partial pressurepulsed biashydrophobicityfriction and wear
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