首页|Na+/g-C3N4材料的制备及光催化降解亚甲基蓝机理

Na+/g-C3N4材料的制备及光催化降解亚甲基蓝机理

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制备碱金属掺杂的g-C3N4在g-C3N4半导体光催化材料研究中属于一个重要分支。本研究采用溶液合成、煅烧和溶剂热反应方法制备了 Na+掺杂的g-C3N4样品(Na+/g-C3N4),通过不同检测手段确定了 Na+在g-C3N4中的负载位置和光电性能,考察了样品的形貌、比表面积及孔径随溶剂热反应时间延长的变化规律。结果表明:Na+负载位置和表面生成的C-O-基团增强了 g-C3N4材料的物理和化学吸附性能,Na+/g-C3N4对亚甲基蓝(MB)的吸附率最高可达到93。25%;Na+负载位置对g-C3N4的π共轭体系的电子分布产生影响,进而改变了材料的禁带宽度(Eg)、导(价)带位置和光生载流子分离效率及传输速率;在可见光降解过程中,由于MB的自身光敏性和在Na+/g-C3N4样品表面的强吸附性,MB和Na+/g-C3N4样品构建了独特的光敏-光催化降解体系,MB不仅通过光敏自降解,还在Na+/g-C3N4协同下进行了光催化降解。在pH 6。0条件下,MB和Na+/g-C3N4光催化体系对MB的最高降解率可达96。40%。
Preparation of Na+/g-C3N4 Materials and Their Photocatalytic Degradation Mechanism on Methylene Blue
Preparation of alkali metal doped g-C3N4 materials is an important branch in the research of g-C3N4 semiconductor photocatalytic materials.However,there is still lack of study on g-C3N4 materials revealing mechanisms in photosensitizer-assisted photocatalytic degradation.In this study,Na+doped g-C3N4 photocatalysts(Na+/g-C3N4)were prepared using solution synthesis,calcination,and solvothermal reaction methods.The doped position of Na+in g-C3N4 and photoelectric performance were determined.The changes of morphological,specific surface area,and pore size of Na/g-C3N4 materials were analyzed by scanning electron microscopy,N2 adsorption and desorption experiments.In Na/g-C3N4 materials,the Na+loaded in a cyclic structure composed of three heptazine structural units,coordinating with N atoms.Na/g-C3N4 changed the adsorption performance of g-C3N4,altered its bandgap width and position of conduction(valence)band,and increased its separation rate of photogenerated electrons and holes and charge transport rate of the material by affecting the 兀-conjugated system of g-C3N4.During the solvothermal reaction process for synthesis of Na+/g-C3N4,strong hydrolysis caused decomposition of unstable structures of g-C3N4 while the C-O-bonds were formed at the edge of g-C3N4.The physical and chemical adsorption sites for methylene blue(MB)of Na+/g-C3N4 materials are confirmed byπ-conjugated system and C-O-bonds of Na+/g-C3N4,by which Na+/g-C3N4 materials can adsorb MB up to 93.25%,in contrast to the g-C3N4 materials'adsorbtion only up to 24.50%.Under visible light irradiation,due to their strong adsorption capacity and photosensitivity to MB,Na+/g-C3N4 materials have constructed a unique photosensitive-photocatalytic degradation system with MB.MB not only acts as the photosensitizer for self degradation but also collaborates with Na+/g-C3N4 materials for photocatalytic degradation.At pH 6.0,the maximum degradation rate of MB is up to 96.40%in the photosensitive-photocatalytic system constructed with MB and Na+/g-C3N4 samples.

g-C3N4Na+dopingphotosensitizationphotocatalytic mechanism

李秋实、殷广明、吕伟超、王怀尧、李婧琳、杨红光、关芳芳

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齐齐哈尔大学 分析测试中心,齐齐哈尔 161006

齐齐哈尔大学 化学与化学工程学院,齐齐哈尔 161006

石墨相碳化氮 Na+ 掺杂 光敏化 光催化机理

黑龙江省省属高等学校基本科研业务费

135509106

2024

无机材料学报
中国科学院上海硅酸盐研究所

无机材料学报

CSTPCD北大核心
影响因子:0.768
ISSN:1000-324X
年,卷(期):2024.39(10)