Application of X-ray photoelectron spectroscopy in analysis of passivation film of tinplate
The passivation film of tinplate was characterized by X-ray photoelectron spectroscopy.The testing parameters were varied to investigate the influence of different conditions on the elemental analysis of passivation film of tinplate.The results showed that the larger the test spot size,the higher the peak intensity and the narrower the half-peak width of spec-tral peak.The pass energy of the full spectrum test was improved,and the effect was the best when the pass energy in high-resolution narrow spectrum test was controlled at 20-50 eV.The thickness of polluted carbon and passivation film of tinplate was studied by the depth profiling technique of X-ray photoelectron spectroscopy.The results showed that the thickness of polluted carbon film on tin plate surface was about 2 nm,and the thickness of passivation film was about 28 nm.The meas-ure result of passivation film thickness was basically consistent with that obtained by glow discharge spectrometry.
X-ray photoelectron spectroscopytinplatepassivation film
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