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光电膜层光电特性的成像测量

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光电探测器的光电膜层的光电特性与膜层上各点的吸收系数和光电转换系数有关.为了测量光电膜层光电特性的二维空间分布,提出了基于单像素成像的膜层光电特性测量方法.在该方法中,光电膜层既是成像对象,又是信号探测器,可以实现自探测成像.采用四步相移条纹投影方法,导出膜层光电特性单像素成像公式;以光电池膜层为研究对象,采用白光、红光、绿光和蓝光对其光电特性进行二维成像.实验结果表明:该方法能够以一定的空间分辨率对光电膜层的光电特性进行成像测量,空域上的灰度平均值和标准方差、频域上的频谱分布特点可以评估膜层的光电特性强弱和均匀性.
Imaging measurement of photoelectric characteristics of photoelectric films
The optoelectronic characteristics of optoelectronic films of the photo-detectors are re-lated to the absorption coefficient and optoelectronic conversion coefficient.In order to measure the 2 D distribution of optoelectronic characteristics of optoelectronic films,the measurement method of the photoelectric characteristics based on single pixel spectrum detection imaging was proposed.The pho-toelectric film itself was not only the imaging object but also a signal detector,i.e.,it could realize the self-measuring imaging.Firstly,the four step phase-shifting fringe projection method was used to derive the single pixel imaging formula for optoelectronic characteristics of the film.For the case that a photocell film was used as a test object,white light,red light,green light and blue light were used to perform the 2 D imaging.The results showed that the method could measure the optoelectronic characteristics 2 D distribution of optoelectronic films with a certain spatial resolution,the grayscale average,standard deviation and spectral distribution characteristics in the frequency domainwere could be used to evaluate the conversion strength and the uniformity of optoelectronic characteristics.

optoelectronic characteristic distributionsingle pixel detectioncomputational ima-gingspectrum reconstruction

郑焕玲、杨初平

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华南农业大学 电子工程学院,广东 广州 510640

光电特性分布 单像素探测 计算成像 频谱重建

国家自然科学基金华南农业大学质量工程项目

12104165zlgc22032

2024

物理实验
东北师范大学

物理实验

影响因子:0.573
ISSN:1005-4642
年,卷(期):2024.44(4)
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