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复合衬底薄膜砷化镓太阳电池技术研究

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针对薄膜砷化镓(GaAs)太阳电池,提出了一种复合衬底结构及其一体化制备方法.采用微加工方法使该薄膜砷化镓太阳电池的复合式柔性衬底的厚度降低至15 μm,薄膜GaAs太阳电池整体面密度低至95 g/m2,光刻形成的金属微孔使砷化镓与衬底背面底电极电学导通.此外,提出的复合衬底一体化制备方法可避免传统薄膜GaAs电池键合过程对砷化镓外延层造成的影响,提高太阳电池工艺可靠性.薄膜GaAs太阳电池电性能测试及疲劳测试结果均表明该一体化制备方法在提高工艺可行性、降低工艺复杂度的同时其电池电性能无明显降低.该复合衬底的薄膜GaAs太阳电池及其一体化制备方法在未来有着广阔的应用前景.
Research on Thin-Film GaAs Solar Cell Technology with Composite Substrate
A composite substrate structure and integrated preparation process for thin-film gallium arsenide(GaAs)solar cell was presented.The thickness of the composite flexible substrate of the thin-film GaAs solar cell is reduced to 15 μm by micro-machining method,and the overall surface density of the thin-film GaAs solar cell is as low as 95 g/m2.The metal microholes formed by photolithography make gallium arsenide electrically conductive to the back electrode of the substrate.In addition,the proposed composite substrate integrated preparation process can avoid the influence of traditional thin-film GaAs cell bonding process on GaAs epitaxial layer,and improve the process reliability of solar cell.The results of electrical performance test and fatigue test of thin-film GaAs solar cell show that the integrated preparation process can improve the feasibility of the process and reduce the complexity of the process,while the electrical performance of the cell is not significantly reduced.The thin-film GaAs solar cell with composite substrate and its integrated preparation process have a wide application prospect in the future.

thin-film solar cellcomposite substrategallium arsenide(GaAs)flexible thin film cellsurface density

郭哲俊、施祥蕾、周丽华、张占飞、钱勇、吴敏、李彬、王波、孙利杰、王训春

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上海空间电源研究所空间电源全国重点实验室,上海 200245

薄膜太阳电池 复合衬底 砷化镓(GaAs) 柔性薄膜电池 面密度

2025

微纳电子技术
中国电子科技集团公司第十三研究所

微纳电子技术

影响因子:0.283
ISSN:1671-4776
年,卷(期):2025.62(1)