Design and Implementation of Vertical Atomization Assisted CVD System
The atomization assisted chemical vapor deposition(CVD)technology is a method for low-cost preparation of high-quality oxide thin films.A vertical atomization assisted CVD system was designed and constructed,which included atomization source,vertical reaction chamber,heating,water cooling and exhaust gas treatment modules.SnO2 thin film was prepared by the system,X-ray diffractometer(XRD)was used to analyze the thin film samples,and the surface morphology of the samples was observed by scanning electron microscope(SEM).The experimental results show that the SnO2 thin film growing along the(200)crystal plane is prepared by the designed vertical atomization assisted CVD system.The half-height and width of(200)diffraction peak for the SnO2 thin film is 0.22°.The larger grains on the surface of the SnO2 thin film are pyramid-like,and the particle size on the surface of the thin film is relatively uniform.The calculated average particle size of maximum particles on the surface of the thin film is 145 nm.The designed system has reasonable structure and simple operation,and the prepared film has high quality.
atomization assisted chemical vapor deposition(CVD)thin film deposition system designvertical chamberSnO2 thin filmstructure and morphology
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