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扇出型晶圆级封装翘曲仿真与控制研究进展

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对扇出型晶圆级封装晶圆重构工艺过程中翘曲产生的原因进行阐述,总结了近年来国内外翘曲仿真与控制的研究进展.从晶圆重构工艺所用的材料、设计的重构结构,以及重构涉及的模塑固化、减薄和解键合等方面的仿真分析结果,分析了翘曲的形成原因.此外,将晶圆重构仿真分析结果与实验测试结果进行对比.最后,对重构晶圆翘曲矫正未来的发展方向进行展望.
Research progress in warping simulation and control of fan-out wafer-level packaging
This paper introduces the causes of warping during wafer reconstruction in the fan-out wafer-level packaging process briefly,and summarizes the research progress of warping simulation and control both at home and abroad in recent years.The causes of warping are introduced from the simulation analysis results of the materials used in the wafer reconstruction technique,the designed reconstruction structure,and the molding curing,thinning,debonding processes involved in the reconstruction.In addition,the simulation analysis capabilities of wafer reconstruction are compared with experimental results.Finally,this paper prospects the future development direction of reconstructed wafer warping correction.

fan-out wafer-level packagingwafer reconstructionwarping correctionfinite element analysis

朱炳皓

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贵州振华风光半导体股份有限公司 贵阳 550018

扇出型晶圆级封装 晶圆重构 翘曲矫正 有限元分析

2024

微纳电子与智能制造

微纳电子与智能制造

ISSN:
年,卷(期):2024.6(1)
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