首页|基于自建测试平台的GaN基HEMT器件陷阱表征

基于自建测试平台的GaN基HEMT器件陷阱表征

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陷阱效应是影响GaN基HEMT器件性能的主要因素之一.为了提高陷阱表征的精度和时间分辨率,采用瞬态电压法并搭建了专用的测试平台对陷阱进行表征,抑制了电压漂移现象,将时间分辨率从毫秒级提升至微秒级,扩大了陷阱的表征范围,同时基于贝叶斯反卷积算法提取陷阱的时间常数等信息.基于这种方法研究了GaN基HEMT中陷阱在不同电压和温度下的捕获行为,表征其时间常数和激活能等信息.实验结果表明,该器件中存在4 种不同类型的陷阱,除了先前已经在B1505上证明的激活能分别为0.058、0.041 eV的陷阱DP2 和DP3,本文还发现了位于微秒级的新陷阱DP1,激活能为0.063 eV.本文通过搭建测试平台填补了微秒级陷阱表征的空缺,为陷阱的准确、快速表征提供了极大便利.
Trap characterization of GaN-based HEMT devices based on a self-built test platform
The trap effect is one of the main factors affecting the performance of GaN-based high electron mobility transistor(HEMT)devices.To improve the accuracy and temporal resolution of trap characterization,this paper employs the transient voltage method and constructs a dedicated test platform for characterizing traps.This method suppresses the voltage drift phenomenon,improves the temporal resolution from the millisecond level to the microsecond level,expands the characterization range of traps,and extracts information such as the time constants of traps based on the Bayesian deconvolution algorithm.Based on this method,this paper studies the capture behavior of traps in GaN-based HEMT under different voltages and temperatures,characterizes their time constants and activation energies.The experimental results show that there are four types of traps in this device.In addition to the previously proven DP2 and DP3 traps on B1505 with activation energies of 0.058 eV and 0.041 eV respectively.This paper also discovers a new trap DP1 at the microsecond level with an activation energy of 0.063 eV.By constructing the test platform,this paper fills the gap in the characterization of microsecond-level traps to provid great convenience for accurate and rapid characterization of traps.

GaN-based HEMTtrap characterizationtransient voltage methodtime constant spectrumBayesian iterationself-built test platform

杜颖晨、温茜、冯士维、张亚民

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北京工业大学微电子学院 北京 100124

GaN基HEMT 陷阱表征 瞬态电压法 时间常数谱 贝叶斯迭代 自建测试平台

国家自然科学基金资助项目国家自然科学基金资助项目北京市自然科学基金资助项目

6207400962334002L233023

2024

微纳电子与智能制造

微纳电子与智能制造

ISSN:
年,卷(期):2024.6(1)
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