Effect of substrate temperature on the infrared emission performance of TiCuN films
In order to study the properties of TiCuN films,especially the infrared emission prop-erties,TiCuN films were deposited using reactive magnetron co-sputtering on glass substrates,and the effects of different substrate temperatures(25,200,300,400 ℃)on the phase composi-tion,microstructure,surface wettability resistivity and infrared emissivity of TiCuN films were investigated.The results show that the prepared film is formed as TiCuN ternary solid solution when the substrate temperature was 25 ℃.When the substrate temperature is higher than 200 ℃,Cu separates from the TiCuN phase and the prepared films consist of two components:TiCuN phase and metallic Cu nanoparticles.The water contact angles of the prepared TiCuN films are all greater than 100°,showing the good hydrophobicity.The surface of TiCuN film de-posited at aubstrate temperature of 25 ℃ is covered with a large number of nano-pores and tiny punctate nanoparticles,and thus the surface is uneven.With the increase in substrate tempera-ture,the nanoparticles grow,the nano-pores decreases or even disappeare,and thus the surface of the film became compact and flat.Due to the change in the phase composition and microstruc-ture,the resistivity and infrared emissivity of TiCuN films decreased significantly with increasing substrate temperature.The resistivity and infrared emissivity of TiCuN films could be reduced effectively by increasing the substrate temperature.The trend of infrared emissivity is consistent with that of resistivity.
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