多功能复合磁控溅射平台的应用研究
Application of multifunctional composite magnetron sputtering platform
范志鹏 1韩辉 1张松林2
作者信息
- 1. 沈阳理工大学,辽宁 沈阳 110168
- 2. 成都超迈光电科技有限公司,四川 成都 610012
- 折叠
摘要
磁控溅射具有沉积温度低、薄膜致密且牢固等优点,广泛用于制备超硬膜等各种功能性薄膜,但也存在离化率和沉积速率较低、溅射平台功能较单一等缺陷,难以实现特种功能薄膜严苛的技术要求.为解决以上问题,设计了具有前后双开门、可安装多个不同类型的溅射阴极、离子源和行星工件转架可接高压脉冲偏压等的复合溅射平台,对真空镀膜室、水冷系统、整体绝缘的多工位工件转架和真空气路系统进行了优化设计,并通过理论计算、有限元分析校核了该设计的可行性.
Abstract
Magnetron sputtering has the advantages of low deposition temperature,and dense and sturdy thin films,and is widely used to prepare functional films.However,it has the defects such as insufficient ionization rate,low deposition rate,and single function,making it difficult to meet the strict technical requirements of special functional films.To solve the above problems,a composite sputtering platform is designed,which has front and rear doors,can install multiple sputtering cathodes and ion sources,and has planetary workpiece turntables that can be connected to high-voltage pulse bias voltage.The vacu-um coating chamber,water cooling system,multi-station workpiece turntables with overall insulation,and vacuum gas circuit system are optimized.The feasibility of this design is verified through theoretical calculations and finite element analysis.
关键词
物理气相沉积/磁控溅射平台/溅射阴极/真空气路系统Key words
physical vapor deposition/magnetron sputtering platform/sputtering cathode/vacuum gas circuit system引用本文复制引用
出版年
2024
NETL
NSTL
万方数据