Properties of CdS thin films prepared by radiofrequency magnetron sputtering
In this paper,CdS thin film is deposited on glass and Si(111)substrates by using radiofrequency magnetron sputtering technology,and the effects of sputtering power on the structural,optical and electrical properties of the films are studied.The X-ray diffraction results show that the CdS thin films prepared under different sputtering powers are preferentially grown in the(002)direction,and their grain size and surface roughness increase with the increase of sputtering power.Transmission spectroscopy analysis shows that the CdS thin film has a large transmittance in the near-infrared region.The results of Tauc curve show that the band gap of the films decreases with the increase of sputtering power.The Hall effect test shows that the resistivity of the films decreases with the increase of sputtering power,while the carrier concentration increases with the increase of sputtering power.The research results can provide a reference for the application of CdS thin films in optoelectronic devices.
万方数据
维普
