Design and Manufacture of CD-AFM Probe Based on High-Aspect-Ratio Structure
The conventional atomic force microscope(AFM)and critical-dimension atomic force microscope(CD-AFM)probes are limited by the low effective scanning height of the tip,which prevents the accurate scanning and imaging of deep trenches and large overhanging sidewall structures.Hence,a design and preparation scheme for a new CD-AFM probe with a large-aspect-ratio tip structure is proposed herein.The developed CD-AFM probe has an effective tip height of 5.1-5.8 μm and an aspect ratio of 14.The improved effective height is approximately four times that of conventional silicon-based CD-AFM probes.Finally,the developed probe isevaluated using a deep-trench sample with a nominal depth of 2.3 μm and an aspect ratio of 4.6.
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