首页|Interfacial Oxygen Octahedral Coupling-Driven Robust Ferroelectricity in Epitaxial Na0.5Bi0.5TiO3 Thin Films

Interfacial Oxygen Octahedral Coupling-Driven Robust Ferroelectricity in Epitaxial Na0.5Bi0.5TiO3 Thin Films

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The oxygen octahedral rotation(OOR)forms fundamental atomic distortions and symmetries in perovskite oxides and definitely determines their properties and functionalities.Therefore,epitaxial strain and interfacial structural coupling engineering have been developed to modulate the OOR patterns and explore novel properties,but it is difficult to distinguish the 2 mechanisms.Here,different symmetries are induced in Na0.5Bi0.5TiO3(NBT)epitaxial films by interfacial oxygen octahedral coupling rather than epitaxial strain.The NBT film grown on the Nb:SrTiO3 substrate exhibits a paraelectric tetragonal phase,while with La0.5Sr0.5MnO3 as a buffer layer,a monoclinic phase and robust ferroelectricity are obtained,with a remanent polarization of 42 μC cm-2 and a breakdown strength of 7.89 MV cm-1,which are the highest record among NBT-based films.Moreover,the interfacial oxygen octahedral coupling effect is demonstrated to propagate to the entire thickness of the film,suggesting an intriguing long-range effect.This work provides a deep insight into understanding the structure modulation in perovskite heterostructures and an important avenue for achieving unique functionalities.

Haojie Han、Qinghua Zhang、Wei Li、Yiqun Liu、Jiasheng Guo、Yue Wang、Qian Li、Lin Gu、Ce-Wen Nan、Jing Ma

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State Key Laboratory of New Ceramics and Fine Processing,School of Materials Science and Engineering,Tsinghua University,Beijing 100084,China

Beijing National Laboratory for Condensed Matter Physics,Institute of Physics,Chinese Academy of Sciences,Beijing 100190,China

National Key Research Program of ChinaNational Natural Science Foundation of ChinaNational Natural Science Foundation of ChinaNational Natural Science Foundation of ChinaNational Natural Science Foundation of China

2022YFB380760452027817520724005202502552150092

2024

研究(英文)

研究(英文)

CSTPCD
ISSN:
年,卷(期):2024.2024(2)
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