有机化学2024,Vol.44Issue(1) :85-110.DOI:10.6023/cjoc202307004

可见光介导的三氟甲基的选择性C—F键断裂及其在偕二氟类化合物合成中的应用

Visible Light-Mediated Selective C—F Bond Cleavage of Trifluoro-methyl Groups and Its Application in Synthesizing gem-Difluoro-Containing Compounds

金玉坤 任保轶 梁福顺
有机化学2024,Vol.44Issue(1) :85-110.DOI:10.6023/cjoc202307004

可见光介导的三氟甲基的选择性C—F键断裂及其在偕二氟类化合物合成中的应用

Visible Light-Mediated Selective C—F Bond Cleavage of Trifluoro-methyl Groups and Its Application in Synthesizing gem-Difluoro-Containing Compounds

金玉坤 1任保轶 1梁福顺2
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作者信息

  • 1. 沈阳化工大学理学院 沈阳 110142
  • 2. 辽宁大学化学院 沈阳 110036
  • 折叠

摘要

偕二氟类化合物独特的性质使其在医药、材料领域受到广泛关注.将廉价、易得的三氟甲基转化为偕二氟基团,在有机合成中具有重要意义,但是选择性断裂C—F键面临巨大的挑战,因为三氟甲基中C—F键断裂的解离能远高于产物偕二氟基团中C—F键解离能,即难以控制C—F键的选择性断裂,极易发生过度脱氟.相对于传统热反应,在可见光促进下,利用光催化剂敏化底物,创造一条经过激发态的新反应途径,可以更加高效、高选择性地实现C—F断裂.对近三年来利用可见光催化三氟甲基的选择性C—F键断裂制备偕二氟类化合物的研究进展进行了分析和总结,并对其前景进行了展望.

Abstract

The unique properties of difluorinated compounds have attracted widespread attention in the fields of medicine and material sciences.The conversion of inexpensive and easily available trifluoromethyl groups into difluoro groups is of great importance in organic synthesis.However,there still exist great challenges in the selective cleavage of C—F bonds,because the dissociation energy of single C—F bond in trifluoromethyl group is much higher thanthat of the C—F bond in the difluoro unit of the generated product.Thus,the selective cleavage of C—F bond is difficult to control,which can easily lead to exces-sive defluorination.Compared with the traditional thermal reaction,the visible-light irradiated reaction provides an alternative pathway to achieve C—F cleavage more efficiently and selectively.The research progress on the selective cleavage of C—F bonds mediated by visible light in the past three years is summarized and its futureperspective is prospected.

关键词

光催化/自由基/C—F键断裂/偕二氟化合物/合成

Key words

photocatalysis/free radical/C—F fracture/germinal difluoro-compound/synthesis

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基金项目

辽宁省自然科学基金面上项目(2021-MS-254)

出版年

2024
有机化学
中国化学会,中国科学院上海有机化学研究所

有机化学

CSTPCD北大核心
影响因子:1.09
ISSN:0253-2786
参考文献量115
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