Influence of exposure process on the clarity of blue phase liquid crystal patterns
In order to improve the edge resolution of patterned Blue Phase Liquid Crystal Films(BPLCF)and make the patterns clearer while reducing the complexity of the preparation process,based on the thiola-crylate Michael addition reaction,this study utilizes stepwise mask exposure under constant temperature to design and prepare patterned BPLCF.Firstly,the changes in the optical properties of BPLCF during the Michael addition reaction were observed.Combining the spectral full width at half maximum(FWHM)and reflectance,the reaction time with relatively good BP I texture was determined.Then,based on the selected reaction time,the effects of different exposure intensities on the optical performance and pattern resolution of BPLCF under the same UV exposure time were explored.The optimal UV exposure intensity for producing patterned BPLCF with clear patterns and high edge resolution was determined.Finally,according to the experimentally obtained reaction time and UV exposure intensity,BPLCF with high-resolution orchid and plum blossom patterns were prepared.Experimental results showed that at a constant temperature of 33℃,Michael addition reaction time of 60 min,UV exposure intensity of 30 mW/cm²,and exposure time of 15 s,the BP I structure was well preserved,the BPLCF pattern was clear with no shadow at the edge,and the corresponding central wavelength and FWHM were 528 nm and 53 nm,respectively,with a resolution of up to 38 μm.This research is of great significance for the preparation of high-resolution blue phase liquid crystal patterns and their applications in information anti-counterfeiting and display fields.
blue phase liquid crystalpatternedmichael addition reactionhigh resolutionUV exposure intensity
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