首页|PEG含量对多孔膜光学带隙及激光损伤特性的影响

PEG含量对多孔膜光学带隙及激光损伤特性的影响

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采用溶胶凝胶技术结合旋涂法,在石英基底及Si基底上分别制备了孔隙率不同的TiO2和SiO2 薄膜,并对两者的光学及激光损伤特性进行了研究.根据透射光谱曲线计算出薄膜的光学带隙,发现光学带隙随着孔隙率的增大而增大,TiO2 薄膜的光学带隙大小为 3.75 eV~3.97 eV,SiO2 薄膜的光学带隙大小为3.52 eV~3.78 eV.椭偏测量结果表明,当聚乙二醇(polyethylene glycol,PEG)质量分数从 0、0.8%、4.0%提高至 8.0%时,在波长 1 064 nm处,TiO2 薄膜的孔隙率从 11.5%、14.1%、30.9%增大至 38.7%,折射率从 2.063 5、2.016 5、1.748 1降低至 1.640 9;SiO2 薄膜的孔隙率从4.04%、4.6%、5.7%提升至 13.9%,折射率从 1.438 6、1.435 8、1.420 4降低至 1.387 9.除PEG质量分数为 0.8%的TiO2 薄膜外,所有TiO2 和SiO2 薄膜样品的消光系数均优于 10-3,说明薄膜的吸收较小.薄膜的激光损伤阈值(laser induced damage threshold,LIDT)受孔隙率的影响较大,孔隙率越大,TiO2 薄膜的激光损伤阈值越高,其值最高可达 16.7 J/cm2;而SiO2 薄膜的激光损伤阈值较未添加PEG的激光损伤阈值并未提高,当PEG质量分数从 0.8%增加到 8.0%时,SiO2 薄膜的激光损伤阈值提高了1.9 J/cm2.总而言之,提高孔隙率有助于提高薄膜的抗激光损伤性能.
Influence of PEG content on optical band gap and laser damage characteristics of porous films
TiO2 and SiO2 films with different porosity were prepared on quartz substrate and Si substrate respectively by sol-gel technique combined with spin coating method,and the optical and laser damage characteristics of both films were investigated.The optical band gap of the films was calculated based on the transmission spectral curves.It was found that the optical band gap increased with the increase of porosity,the optical band gap size of TiO2 films ranged from 3.75 eV to 3.97 eV,and that of SiO2 films ranged from 3.52 eV to 3.78 eV.The ellipsometry measurement results show that when the mass fraction of polyethylene glycol(PEG)was increased from 0,0.8%,4%to 8%at a wavelength of 1 064 nm,the porosity of TiO2 films increased from 11.5%,14.1%,30.9%to 38.7%,and the refractive index decreased from 2.063 5,2.016 5,1.748 1 to 1.640 9;the porosity of SiO2 films increased from 4.04%,4.6%,5.7%to 13.9%,and the refractive index decreased from 1.438 6,1.435 8,1.420 4 to 1.387 9.The extinction coefficients of all TiO2 and SiO2 film samples are better than 10-3 except for the TiO2 film with PEG mass fraction of 0.8%,which indicates that the absorption of the films is smaller.The laser induced damage threshold(LIDT)of the films is greatly influenced by the porosity,and the larger the porosity,the higher the LIDT of TiO2 films,with a value up to 16.7 J/cm2.However,the LIDT of SiO2 film is not improved compared with that without PEG,and when the PEG mass fraction increased from 0.8%to 8%,the LIDT of SiO2 film increased by 1.9 J/cm2.In summary,improving the porosity helps to improve the laser damage resistance of the film.

sol-gel methodTiO2SiO2polyethylene glycoloptical band gaplaser damage threshold

孙少斌、徐均琪、苏俊宏、李阳、王通、刘政

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西安工业大学陕西省薄膜技术与光学检测重点实验室,陕西西安 710021

中国科学院西安光学精密机械研究所先进光学制造技术联合实验室,陕西西安 710119

溶胶凝胶法 TiO2 SiO2 聚乙二醇 光学带隙 激光损伤阈值

国家自然科学基金项目

62205263

2024

应用光学
中国兵工学会 中国兵器工业第二0五研究所

应用光学

CSTPCD北大核心
影响因子:0.517
ISSN:1002-2082
年,卷(期):2024.45(4)