Key Technologies for the Fabrication of Photographic Dry Film Microstructure Molds
The key techniques of micro-structure mold fabrication based on negative photosensitive dry film are presented.The key experimental parameters such as spectral characteristics of light source,ultraviolet light source power,exposure time,developing time and developing concentration are selected and optimized,and the causes of experimental phenomena are analyzed.Furthermore,the properties of dry film under the limit experimental conditions are studied to provide technical support for dry film storage,cutting and airing time.The dry film microstructure mold prepared by this process can encapsulate polydimethylsiloxane(PDMS)microfluidic chips with different structures and functions.The experimental results show that compared with the traditional soft lithography method,the dry film microstructure mold fabrication process has the advantages of saving time,simple process,no ultra-clean room and expensive exposure equipment,etc.The prepared dry film microstructure mold has high surface flatness and success rate,and good application effect.
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