The article used RF-CVD deposition method to deposit diamond-like carbon films on silicon(111)substrate with methane and hydrogen as reactants,and analyzed the effect of different argon gas flow rates on the properties of diamond-like carbon films.U-sing a laser Raman spectrometer to analyze the structural characteristics of diamond-like carbon films,it was found that there is a clear broad G peak in the range of 1400～1700 cm 1,while a weak shoulder D peak appears in the range of 1300～1400 cm-1.It was shown that the films prepared when the argon flow rate was 0 ml/min and 10 ml/min were in accordance with the typical characteristics of diamond-like carbon films;and with the increase of argon concentration,the growth of diamond-like carbon,the inhibition of impurity generation,and the reduction of hydrogen content in diamond-like carbon could be promoted.When the argon concentration increased to a certain value,it began to in-hibit the growth of diamond-like carbon,until the diamond-like carbon could not be grown.The best diamond-like carbon films were obtained when the argon flow rate was 10 ml/min.
关键词
等离子增强化学气相沉积/类金刚石碳膜/拉曼光谱
Key words
Plasma enhanced chemical vapor deposition/Diamond-like carbon films/Ra-man spectra
维普
万方数据