首页|Ag/Al2O3/ZnO复合膜的制备及其电磁屏蔽性能研究

Ag/Al2O3/ZnO复合膜的制备及其电磁屏蔽性能研究

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应用于光学窗口等军用场景的电磁屏蔽材料需要同时具备较高的电磁屏蔽性能和透光率.为实现该目标,通过磁控溅射沉积银(Ag)、氧化铝(Al2O3)、氧化锌(ZnO)制成复合膜并比较不同结构下的综合性能.结果表明,复合膜缓解了金属的高反射导致在可见光内透光率较低的问题,保持了良好的屏蔽性能和稳定性.其中10 nm Ag/25 nm Al2O3/40 nm ZnO复合膜综合性能最好,方块电阻为6 Ω/sq,平均透光率达到78.66%,0.01~9 GHz频带内平均电磁屏蔽为24.49 dB,最高屏蔽性能达到57 dB.
Preparation of Ag/Al2 O3/ZnO Composite Film and Its Electromagnetic Shielding Performance
Electromagnetic shielding materials used in military scenarios such as optical windows need to have high electromagnetic shielding performance and light transmittance at the same time.In order to achieve this goal,the composite films were made by magnetron sputtering to deposit silver(Ag),alumina(Al2O3)and zinc oxide(ZnO)and compare the comprehensive properties under different structures.The results show that the composite film alleviates the problem of low light transmittance in visible light caused by high reflection of metal,and maintains good shielding performance and stability.Among them,the 10 nm Ag/25 nm Al2O3/40 nm ZnO composite film has the best comprehensive performance,with a block resistance of 6 Ω/sq,an average light transmittance of 78.66%,an average electromagnetic shielding of 24.49 dB in the 0.01~9 GHz band,and a maximum shielding performance of 57 dB.

magnetron sputteringelectromagnetic shieldinghigh light transmittancemetal and metal oxide composite filmlight transmittance

武超、宋亚浩

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洛阳理工学院电气工程与自动化学院,河南 洛阳 471023

上海电力大学数理学院,上海 201306

磁控溅射 电磁屏蔽 高透光性 金属与金属氧化物复合膜 透光率

2024

自动化应用
重庆西南信息有限公司

自动化应用

影响因子:0.156
ISSN:1674-778X
年,卷(期):2024.65(15)