摘要
目前微波等离子体化学气相沉积法(MPCVD)是制备半导体单晶金刚石的主要方法,但是制备的单晶金刚石在质量和尺寸方面还难以达到高性能半导体器件的要求,这限制了金刚石在半导体领域的产业化应用.本文基于专利数据对MPCVD法制备单晶金刚石的技术发展趋势、地域布局、申请人分布、技术演进方向和重点申请人技术策略进行分析,为我国创新主体把握技术趋势、规划研发方向、进行技术布局保护提供相关建议.
Abstract
Currently,microwave plasma chemical vapor deposition(MPCVD)is the main method for preparing single crystalline diamond for semiconductors,but the preparation of single crystalline diamond still cannot meet the requirements of high performance semiconductor devices in terms of quality and size which limits the industrial application of diamond in the semiconductor field.The MPCVD method to prepare single crystalline diamond is analyzed on basis of patent data,including trend of technological development,regional layout,applicant distribution,direction of technology evolution,and key applicant technology strategies,and to provide relevant suggestions for domestic innovation entities to grasp technology trends,plan research and development directions,and technical layout protection.
基金项目
国家知识产权局专利局专利审查协作河南中心2023年度课题(HN20230301)
NETL
NSTL
万方数据