首页|基于专利数据的半导体单晶金刚石制备技术发展现状分析与我国发展对策研究

基于专利数据的半导体单晶金刚石制备技术发展现状分析与我国发展对策研究

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目前微波等离子体化学气相沉积法(MPCVD)是制备半导体单晶金刚石的主要方法,但是制备的单晶金刚石在质量和尺寸方面还难以达到高性能半导体器件的要求,这限制了金刚石在半导体领域的产业化应用.本文基于专利数据对MPCVD法制备单晶金刚石的技术发展趋势、地域布局、申请人分布、技术演进方向和重点申请人技术策略进行分析,为我国创新主体把握技术趋势、规划研发方向、进行技术布局保护提供相关建议.
Analysis of the Development Status of Single Crystalline Diamond Preparation Technology for Semiconductors Based on Patent Data and Research on Development Strategies in China
Currently,microwave plasma chemical vapor deposition(MPCVD)is the main method for preparing single crystalline diamond for semiconductors,but the preparation of single crystalline diamond still cannot meet the requirements of high performance semiconductor devices in terms of quality and size which limits the industrial application of diamond in the semiconductor field.The MPCVD method to prepare single crystalline diamond is analyzed on basis of patent data,including trend of technological development,regional layout,applicant distribution,direction of technology evolution,and key applicant technology strategies,and to provide relevant suggestions for domestic innovation entities to grasp technology trends,plan research and development directions,and technical layout protection.

diamondsingle crystallinesemiconductorMPCVDpatent analysis

罗志昕、程维高、刘清泉、陈红奎

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国家知识产权局专利局专利审查协作河南中心,郑州 450046

金刚石 单晶 半导体 MPCVD 专利分析

国家知识产权局专利局专利审查协作河南中心2023年度课题

HN20230301

2024

中国发明与专利
知识产权出版社,中国发明协会

中国发明与专利

CSTPCD
影响因子:0.15
ISSN:1672-6081
年,卷(期):2024.21(z1)