中国化学前沿2008,Vol.3Issue(1) :18-22.

Preparation and formation mechanism of CdS nano-films via chemical bath deposition

Xiangdong ZHOU Ziheng LI Zhiyou LI Shuang XU
中国化学前沿2008,Vol.3Issue(1) :18-22.

Preparation and formation mechanism of CdS nano-films via chemical bath deposition

Xiangdong ZHOU 1Ziheng LI 2Zhiyou LI 1Shuang XU1
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作者信息

  • 1. College of Physics, Jilin University, Changchun 130021, China
  • 2. National Key Laboratory of Superhard Materials, Jilin University, Changchun 130012, China
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Abstract

CdS semiconductor nano-films were grown on ITO glass substrates by means of chemical bath deposi-tion (CBD), with Cd(NO3)2 as Cd ion and (NH2)2CS as S ion sources. The concentration of Cd ions, deposition temperature, deposition time and post-treatment tem-perature have an impact on the formation of CdS nano-films. UV-vis absorption spectrum and atomic force microscope (AFM) images indicated that the change of concentration and post-treatment temperature may adjust the band-gap of CdS to obtain stable, homo-geneous and compact films. Formation mechanism of the crystal nucleus and CdS film was also discussed. Active sites on the surface of ITO are critical to the formation of the crystal nucleus and a uniform and compact CdS nano-film. The active site and crystal nucleus are formed due to the comprehensive effect of electricity, thermo-dynamics and chemistry.

Key words

CdS nano-film/chemical bath deposition (CBD)/uniform and compact film/active site/crystal nucleus

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基金项目

中国博士后科学基金()

出版年

2008
中国化学前沿
高等教育出版社

中国化学前沿

ISSN:1673-3495
参考文献量2
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