首页|基于掩模光刻的液晶波前校正器设计与制备

基于掩模光刻的液晶波前校正器设计与制备

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液晶波前校正器通常基于液晶显示器的工艺制备而成,因此其研制成本高、定制难度大.本文基于掩模光刻法制备液晶波前校正器,以实现液晶波前校正器的专用化、低成本研制.基于掩模光刻技术设计并制备了 91像素的无源液晶驱动电极,并封装成液晶光学校正单元.设计并制备了驱动连接电路板,实现了液晶光学驱动单元和驱动电路板的匹配对接.对液晶波前校正器响应特性进行检测.结果显示,其相位调制量为 5.5个波长,响应时间为 224 ms.利用Zygo干涉仪进行球面波的产生和静态倾斜像差的校正.结果显示,其可以产生正负离焦波前,且对水平倾斜像差校正后,Zernike多项式中第一项的值从 1.18降至 0.16,校正幅度达 86%,实现了像差的有效校正.本文的研究工作可为液晶波前校正器的研制提供新思路,进而拓宽其应用领域和场景.
Design and fabrication of liquid crystal wavefront corrector based on mask lithography
Liquid crystal wavefront correctors(LCWFCs)exhibit high development cost and customization difficulties due to being fabricated based on the process technology of liquid crystal displays.To achieve spe-cialized and low-cost development of LCWFCs,a liquid crystal wavefront corrector is fabricated by using the mask lithography method.Firstly,a 91-pixel passive liquid crystal driving electrode is designed and pre-pared based on the mask lithography technology and then,packaged as a liquid crystal optical correction unit.A circuit board for driver connection is designed and prepared to connect the optical correction unit and the driving circuit board.Next,the response characteristics of the LCWFC are tested,and the results show that the phase modulation is 5.5 λ,and the response time is 224 ms.Finally,the spherical waves are obtained and the static tilt aberrations are corrected based on Zygo interferometer.The results show that the LCWFC can generate positive and negative defocused wavefronts.Further,after correction of the horizontal tilt aberration,the coefficient of the first term of the Zernike polynomials is decreased from 1.18 to 0.16.Therefore,the ab-erration is corrected with the amplitude of 86%.This work may provide new ideas for the development of LCWFCs,and then expanding their application fields and scenarios.

liquid crystal wavefront correctormask lithographywavefrontresponse characteristicaberra-tion correction

杜莹、陈梅蕊、刘禹彤、曹宗新、毛红敏、李小平、孙会娟、曹召良

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苏州科技大学物理科学与技术学院江苏微纳热流技术与能源应用重点实验室,江苏苏州 215009

济源职业技术学院基础部,河南济源 454682

北京联合大学数理部,北京 100101

液晶波前校正器 掩模光刻 波前 响应特性 像差校正

江苏省重点学科建设项目(十四五)北京联合大学科研项目吉林省科技厅重点研发项目

2021135ZK7020200720220203033SF

2024

中国光学
中国科学院长春光学 精密机械与物理研究所 中国光学学会

中国光学

CSTPCD北大核心
影响因子:2.02
ISSN:2095-1531
年,卷(期):2024.17(2)
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