Adjusting the compactness and hydrophobicity of color filters to decrease gas release during TFT-LCD fabrication
The TFT-LCD industry is moving towards high efficiency and low costs.During the manufactur-ing process,it has been found that various photoresists require different vacuum drying times.To reduce manufacturing time and increase panel yields,clarifying the factors that can influence and reduce the vacu-um time is necessary.This paper explored the relationship between pumping time and the properties of photoresist materials.It finds that the thermal stability of the photoresist has a negligible relationship with the pumping time.The compactness and hydrophobicity of the photoresist correlated strongly with the vacuum drying time.High compactness and high hydrophobicity can effectively prevent water vapor intrusion and storage in the photoresist during fabrication and consequently reduce pumping times.Overall,this work could guide the future development of new photoresists for the TFT-LCD industry.
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