首页|Stable Electron Spin Pan on Aromatic Oxalic Acid Radical

Stable Electron Spin Pan on Aromatic Oxalic Acid Radical

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The stability of organic radicals in ambient condition is important for their practical application.During the development of organic radical chemistry,the electron-withdrawing and steric hindrance groups are usually introduced to improve the stability of radicals via reducing the reactivity of radicals with oxygen in air.Herein,the electron-withdrawing carbonyl groups are introduced to construct a planar aromatic oxalic acid radical(IDF-O8)with two-dimensional electron spin pan structure.Interestingly,IDF-O8 exhibited a low op-tical bandgap of 0.91 eV in film,however,the multiple quinone resonance structures between electron-withdrawing ketone and phe-nol radicals contribute to the high stability of open-shell radical IDF-O8 without protection of large steric hindrance groups.Under the irradiation of 808 nm(1.2 W·cm-2),IDF-O8 reaches 147 ℃ in powder state.This work provides an efficient synthesis route for the open-shell electron spin pan system,which is different from the famous fullerene,carbon nanotube and graphene.The electron spin pan can be extended to spin tube or spin sphere system based on the design strategy of aromatic inorganic acid radicals in future.

SpinSpin panOpen shellAromatic inorganic acid radicalsAggregation-induced radical

Jiaxing Huang、Chenghui Liao、Longtian Guan、Qiao Meng、Sichen Gu、Zhicai He、Yuan Li

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State Key Laboratory of Luminescent Materials and Devices,Institute of Polymer Optoelectronic Materials and Devices,South China University of Technology,Guangzhou,Guangdong 510640,China

Faculty of Materials Science,MSU-BIT University,Shenzhen,Guangdong 518172,China

2024

10.1002/cjoc.202400001

中国化学(英文版)
中国化学会 上海有机化学研究所

中国化学(英文版)

CSTPCD
影响因子：0.848
ISSN：1001-604X
年,卷(期)：2024.42(18)