The different production processes of polycrystalline silicon and their advantages and disadvantages are described.At present,the main method of producing electronic-grade polysilicon is the modified Siemens method.The modified Siemens method consumes a lot of energy and polluted environments in the produced process,it is diffi-cult to mass-produce.The other two methods are silane method and chlorosilane reduction method,which are cur-rently only suitable for the preparation of solar grade polysilicon,whether can be employed to produce the polysilicon of electronic grade needs to be studied in the future.In addition,the analysis shows that:if the chlorosilane reduction method can produce electronic-grade polysilicon,then the combination of chlorosilane reduction method and modified Siemens method can become a new generation of electronic-grade polysilicon production method.
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