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集成电路光刻光源装备的发展历程

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本文研究集成电路光刻光源装备的发展历程,即根据光刻设备的曝光光源的发展时间顺序,分析三代光刻光源装备,对汞灯灯源、准分子激光器以及二氧化碳(CO2)激光器进行简要概述;同时,挖掘和分析其底层光源系统、气体组成以及驱动电路,并对未来光源进行展望.
Development of integrated circuit photolithographic light source driving equipment
This paper studies the development history of integrated circuit lithography light source equipment,analy-ses the three generations of lithography light source equipment according to the development time sequence of expo-sure light source of lithography equipment,gives a brief overview of mercury lamp source,excimer laser and CO2 laser,explores the underlying light source system,gas composition and driving circuit,and prospects the future light source.

mercury lamp sourceexcimer laserCO2 laserphotolithographic light source generation

陈润俊

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五邑大学

汞灯灯源 准分子激光器 CO2激光器 光刻光源产生

2024

中国集成电路
中国半导体行业协会

中国集成电路

影响因子:0.144
ISSN:1681-5289
年,卷(期):2024.33(7)