集成电路光刻光源装备的发展历程
Development of integrated circuit photolithographic light source driving equipment
陈润俊1
作者信息
摘要
本文研究集成电路光刻光源装备的发展历程,即根据光刻设备的曝光光源的发展时间顺序,分析三代光刻光源装备,对汞灯灯源、准分子激光器以及二氧化碳(CO2)激光器进行简要概述;同时,挖掘和分析其底层光源系统、气体组成以及驱动电路,并对未来光源进行展望.
Abstract
This paper studies the development history of integrated circuit lithography light source equipment,analy-ses the three generations of lithography light source equipment according to the development time sequence of expo-sure light source of lithography equipment,gives a brief overview of mercury lamp source,excimer laser and CO2 laser,explores the underlying light source system,gas composition and driving circuit,and prospects the future light source.
关键词
汞灯灯源/准分子激光器/CO2激光器/光刻光源产生Key words
mercury lamp source/excimer laser/CO2 laser/photolithographic light source generation引用本文复制引用
出版年
2024
NETL
NSTL
万方数据