An ion beam surface processing equipment for metallization and etching of infrared chips is introduced in this paper.The effects of deposition rate and etch rate on film uniformity under different process angles are investigat-ed.The results show that both the deposition uniformity and etch uniformity are better than 3％.At the same time,through the production line flow sheet,the infrared chip surface film uniformity is good,high consistency,chip circuit pattern etching steepness,low damage,to meet the requirements of infrared chip metallization and etching process.
关键词
离子束溅射沉积/离子束刻蚀/离子束加工/射频离子源
Key words
ion beam sputter deposition/ion beam etching/ion beam processing/radio-frequency ion source
维普
万方数据