首页|Highly efficient optics/microwave beam splitter based on frequency selective surface

Highly efficient optics/microwave beam splitter based on frequency selective surface

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The development of hybrid optics/microwave communication systems puts forward a new requirement for beam splitters to efficiently transmit microwave signals and simultaneously reflect optical signals.Owing to mechanical constraints,the physical thickness of beam splitters is of the order of tens of millimeters.The corresponding electrical thickness has the same order of magnitude as microwave wavelengths,and the resulting multi-beam interference effect significantly reduces the microwave transmittance,impacting the beam splitting quality.This study presents a new optics/microwave beam splitter based on the ability of the frequency selective surface[FSS]to shape the resonant curve.A beam splitter sample,whose physical thickness and substrate material are 20 mm and quartz glass,respectively,is designed,simulated,fab-ricated,and characterized to validate the feasibility of this strategy.The measured results show that the minimum micro-wave transmittance between 35 and 36.5 GHz with an incidence angle of 45° under TE polarization is 86.43％,and the mean value of the reflectance spectra from 450 to 900 nm and that from 7.7 to 10.5 μm both exceed 96％.This FSS-based optics/microwave beam splitter is expected to play a key role in hybrid optics/microwave communication systems.

beam splittermulti-beam interferencefrequency selective surfacehigh transmission

孙侨、徐念喜、杨海贵、单冬至、汤洋、陈新、王彤彤、高劲松、蔡雨

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Key Laboratory of Optical System Advanced Manufacturing Technology,Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun 130033,China

State Key Laboratory of Applied Optics,Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun 130033,China

University of Chinese Academy of Sciences,Beijing 100049,China

Jilin Provincial Key Laboratory of Advanced Optoelectronic Equipment and Instrument Manufacturing Technology,Changchun 130033,China

Unit 96951 of the People,s Liberation Army,Beijing 100039,China

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2024

10.3788/COL202422.061202

中国光学快报(英文版)
中国光学学会 中国科学院上海光学精密机械研究所

中国光学快报(英文版)

CSTPCD
影响因子：1.305
ISSN：1671-7694
年,卷(期)：2024.22(6)