首页|Common-path illumination in ESPI:enhancing sensitivity for measuring specular deformation

Common-path illumination in ESPI:enhancing sensitivity for measuring specular deformation

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In this study,an innovative technique is introduced to significantly enhance the sensitivity of electronic speckle pattern interferometry(ESPI)for the dynamic assessment of specular(mirrorlike)object deformations.By utilizing a common-path illumination strategy,wherein illumination and observation beams are precisely aligned,this method effectively doubles the optical path difference,leading to a twofold increase in measurement sensitivity.In addition,this method mitigates the effects of speckle noise on the measurement of minor deformations,expanding the applications of ESPI.Theoretical and experimental evaluations corroborate the efficacy of this approach.

ESPIcommon-path illuminationmeasurement sensitivityspecular deformation

闫佩正、刘向玮、周信达、巴荣生、周寒萱、王永红、李杰

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School of Instrument Science and Optoelectronics Engineering,Hefei University of Technology,Hefei 230009,China

Anhui Province Key Laboratory of Measuring Theory and Precision Instrument,Hefei University of Technology,Hefei 230009,China

Laser Fusion Research Center,China Academy of Engineering Physics,Mianyang 621900,China

National Natural Science Foundation of ChinaNational Natural Science Foundation of ChinaKey Research and Development Program of Jiangxi Province

523755365237553520223BBE51010

2024

中国光学快报(英文版)
中国光学学会 中国科学院上海光学精密机械研究所

中国光学快报(英文版)

CSTPCD
影响因子:1.305
ISSN:1671-7694
年,卷(期):2024.22(8)