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氧化限制型795 nm垂直腔面发射激光器

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单模795 nm垂直腔面发射激光器作为铷原子钟的激光光源,一般采用氧化限制结构获得单模输出。对垂直腔面发射激光器外延结构以及氧化限制孔径进行了优化设计。基于有限元分析方法,利用光纤波导理论和热电耦合模型,对氧化孔径的光学和电学限制进行了模拟,计算分析了实现单模和良好热电特性所需的氧化孔径大小。实验制备了具有不同氧化孔径的器件,并进行了功率-电流以及光谱特性测试。当氧化孔径为1。9 μm时,在3~7 mA注入电流下器件始终保持单模输出,边模抑制比大于35 dB;器件保持单模输出的最大氧化孔径为3。8μm,室温下阈值电流为1 mA,最大饱和输出功率为2 mW,斜率效率为0。3 W/A,3 mA注入电流下的出射波长为790 nm,边模抑制比大于30 dB。制备的室温下单模特性良好的790 nm垂直腔面发射激光器,为实现高温下795 nm偏振稳定单模输出提供了可能。
Oxidation-Limited 795 nm Vertical Cavity Surface Emission Laser
Objective The vertical cavity surface-emitting laser(VCSEL)is a type of semiconductor laser that emits light perpendicular to the substrate surface.The VCSEL,as a chip-level atomic clock light source,must possess good single-mode characteristics.Thus the individual frequency required by the atomic clock can be precisely modulated to stimulate the atomic clock's operation,and the atomic clock is ensured not to absorb other signals during the modulation process.The practical design necessitates confining the electric and optical fields of the VCSEL to secure strong single-mode characteristics,while also optimizing the epitaxial structure of the device.This study aims to develop a 795 nm VCSEL device with excellent power characteristics,capable of functioning at high temperatures up to 380 K,and achieving a fundamental mode output in the desired wavelength range.Methods First,the quantum well structure is designed using strain-compensated quantum well band theory and the Kronig-Penney model to determine the material composition and thickness parameters of the quantum well.This ensures that the quantum well material exhibits high gain,with a peak wavelength of 795 nm at the high temperature of 380 K.Next,the distributed Bragg reflector(DBR)is designed using the transfer matrix theory to determine the material compositions of the high and low refractive index layers.The logarithm of the power reflectance for the P-type DBR and N-type DBR is calculated.Following this,the oxide confinement layer is analyzed using the fiber waveguide theory and a thermoelectric coupling model to achieve good single-mode characteristics and thermal properties of the VCSEL.The oxide aperture for the VCSEL in the fundamental mode lasing is calculated.After simulating and calculating the parameters,the devices are fabricated.Different-sized mesa structures are designed in various regions of the layout,and four VCSEL devices with different oxide apertures are fabricated on a single chip.A comparative analysis is performed on these devices to draw conclusions.Results and Discussions The epitaxial wafer results obtained in this study correspond well with the simulation results(Fig.9).Wet oxidation serves to form the oxide confinement aperture under high-temperature conditions.The oxidation depth is controlled by adjusting the oxidation time,resulting in oxide apertures of 1.9,3.8,4.9,and 6.9 μm in a single-chip fabrication process(Fig.12).Power-current measurements are performed on the fabricated devices.For the device with a 3.8 μm oxide aperture,the threshold current measures at 1 mA,the maximum output power is 2 mW,and the slope efficiency is 0.3 W/A(Fig.14).When the oxide aperture is 1.9 μm,the device maintains single-mode output throughout the injection current range of 3-7 mA,with a side-mode suppression ratio exceeding 35 dB.When the oxide aperture is 3.8 μm,the side-mode suppression ratio surpasses 30 dB.The operating wavelength at room temperature hovers around 790 nm,meeting the requirements for applications(Fig.15).Conclusions This study concentrates on the design of a single-mode 795 nm VCSEL device structure and active region.The gain spectrum of In0.08Ga0.79Al0.13As strained quantum wells is simulated.At room temperature(300 K),the gain peak wavelength is 777 nm.At 380 K,the gain peak wavelength shifts to the desired 795 nm range,with a redshift rate of 0.238 nm/K.A single-mode device is achieved by employing an oxide confinement structure.The device structure and oxide aperture are optimized and designed.The optical and electrical limitations of the oxide aperture are simulated using the fiber waveguide theory and a thermoelectric coupling model,resulting in an oxide aperture of 3.72 μm for the VCSEL in single-mode operation.Moreover,VCSELs with oxide apertures of 1.9,3.8,4.9,and 6.9 μm are fabricated in a single-chip process.The fabricated devices are characterized by power-current characteristics and spectral properties.When the oxide aperture is 1.9 μm,the device maintains single-mode output throughout the injection current range of 3-7 mA,with a side-mode suppression ratio exceeding 35 dB.For the device with a 3.8 μm oxide aperture,it operates in single-mode,with a threshold current of 1 mA at room temperature,a maximum saturated output power of 2 mW,a slope efficiency of 0.3 W/A,and an emitted wavelength of 790 nm under 3 mA injection current,with a side-mode suppression ratio exceeding 30 dB.This study successfully obtains a robust single-mode output device with an emission wavelength of 790 nm,consistent with the design.Considering that atomic clocks need to operate at high temperatures and VCSEL emission wavelength redshifts with temperature,with a temperature coefficient of approximately 0.06 nm/K,the devices fabricated in this study have reserved a wavelength redshift of 5 nm.This ensures the achievement of 795 nm single-mode output under high-temperature conditions for atomic clock applications.It lays the foundation for subsequent high-temperature operation and polarization-selective VCSELs.

lasersvertical cavity surface emission lasersrubidium atomic clocksingle modeoxidation limiting layer

聂语葳、李伟、吕家纲、潘智鹏、刘素平、马骁宇

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中国科学院半导体研究所光电子器件国家工程研究中心,北京 100083

中国科学院大学材料科学与光电技术学院,北京 100049

激光器 垂直腔面发射激光器 铷原子钟 单模 氧化限制层

国家自然科学基金

62174154

2024

中国激光
中国光学学会 中科院上海光机所

中国激光

CSTPCD北大核心
影响因子:2.204
ISSN:0258-7025
年,卷(期):2024.51(6)