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紫外/过氧乙酸对铜绿假单胞菌灭活及抗性基因去除

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过氧乙酸(PAA)用于消毒能有效灭活细菌并控制消毒副产物(DBPs)生成,但存在细菌重新复活的问题.为此,探究了紫外/过氧乙酸(UV/PAA)工艺对铜绿假单胞菌的灭活性能和机理.通过灭活、暗修复、膜渗透性分析和电镜扫描等实验及表征方法,发现UV/PAA工艺的灭活性能优于单独紫外线或过氧乙酸,这是因为在UV/PAA体系中产生了自由基和细胞内活性氧(ROS).铜绿假单胞菌的膜通透性随着暴露在UV/PAA体系中时间的增加而增加,且细胞表面结构受到严重破坏,从而导致DNA和蛋白质等胞内物质泄漏.UV/PAA处理能几乎完全抑制细菌暗修复现象,并且进一步灭活可存活但不可培养(VBNC)的细胞,表现出远远超过单独紫外线或过氧乙酸的氧化能力.此外,UV/PAA工艺还可以有效去除水中抗性基因(ARGs).
Effective Inactivation of P.aeruginosa and ARGs Removal in UV/PAA Process:Performance and Mechanisms
Peracetic acid(PAA)can effectively inactivate bacteria and control disinfection byproducts(DBPs).However,it may promote bacterial reactivation after treatment.This study investigated the performance and mechanism of the UV/PAA process for P.aeruginosa inactivation to enhance disinfection.Experimental and characterization methods such as inactivation,dark repair,membrane permeability analysis and electron microscopy scanning showed that the inactivation performance of the UV/PAA process was superior to that of UV or PAA alone due to the generation of free radicals and intracellular reactive oxygen species(ROS)in the UV/PAA system.The membrane permeability of P.aeruginosa increased over time when exposed to the UV/PAA system.Additionally,severe disruption of the cell surface structure was observed,resulting in the leakage of intracellular material such as DNA and proteins.The UV/PAA treatment was highly effective in inhibiting the bacterial dark repair phenomenon and further inactivating the viable but non-culturable(VBNC)cells,demonstrating a far superior oxidation ability of UV or PAA alone.Additionally,the UV/PAA process could efficiently eliminate antibiotic resistance genes(ARGs).

ultravioletperacetic acidinactivationP.aeruginosaviable but non-culturable(VBNC)antibiotic resistance genes

许元生、王珺菽、潘燃、祝淑敏、施周

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湖南大学土木工程学院水安全保障技术及应用湖南省工程研究中心,湖南长沙 410082

紫外 过氧乙酸 灭活 铜绿假单胞菌 存活但不可培养 抗性基因

2025

中国给水排水
中国市政工程华北设计研究院 国家城市给水排水工程技术研究中心

中国给水排水

北大核心
影响因子:0.788
ISSN:1000-4602
年,卷(期):2025.41(1)