首页|Deposition of thin TiO2 films on fluorophlogopite particle surface by CVD in fluidized bed reactor to prepare silver pearlescent pigments

Deposition of thin TiO2 films on fluorophlogopite particle surface by CVD in fluidized bed reactor to prepare silver pearlescent pigments

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Two critical parameters:Glossiness and chromaticity space of pearlescent pigments were evaluated based on crystallinity and grain size.Both the roughness and the vertical distance evolution along the surface of deposited TiO2 film are affected by the crystallinity.The optimal crystallinity of TiO2 was deposited at the temperature of 350 ℃.The TiCl4 concentration effectively changed the grain size.However,the high flow rate of fluidizing gas and optimal gas-solid ratio(<0.11 m3/(kg h))restricted the change of TiCl4 concentrations in fluidized bed reactor.In this case,the grain size of the deposited TiO2 film was about 55 nm.Depending on the grain size,the color of pearlescent pigments was adjusted by controlling the film thickness based on TiO2 concentration.Finally,the silver pearlescent pigment with high glossiness was prepared by chemical vapor deposition method in a fluidized bed reactor.

Fluidized bed chemical vapor depositionTiO2 film depositionPearlescent pigmentFree powder restrainCrystal growth

Ming Liu、Guoqiang Shao、Pengpeng Lv、Jun Li、Qingshan Zhu

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State Key Laboratory of Multiphase Complex Systems,Institute of Process Engineering,Chinese Academy of Sciences,Beijing 100190,China

School of Chemical Engineering,University of Chinese Academy of Sciences,Beijing 100049,China

国家自然科学基金国家自然科学基金国家自然科学基金

222083552197830022178363

2024

颗粒学报(英文版)
中国颗粒学会 中国科学院过程工程研究所

颗粒学报(英文版)

CSTPCD
影响因子:0.632
ISSN:1674-2001
年,卷(期):2024.89(6)
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