Technology development and applications of high precision extreme ultraviolet and X-ray thin film optical systems
Driven by the requirements of microscale observation of matters structure and high energy physics on extreme ultraviolet and X-ray(XUV)systems,our team has performed over 20 years study of the fundamental physics and technology in the XUV thin film optics and systems.The theoretical models for calculation of X-ray scattering/reflection from thin film interfaces were built and the simulation methods for system performance including the thin film opics quality and integrating errors were developed.To fabricate high quality XUV thin film optics,comprehensive structure charaterzation and growth modulation methods were developed;coating techniques with tens of picometers accuracy over hundreds of millimeters area were also developed.New types of XUV multilayer gratings with high efficiency were proposed and demonstrated.Based on these,high precision integration techniques were developed for the fabrication of normal incidence and grazing incidence XUV systems.These optics and systems have been successfully installed and applied in the laser confinement fusion,synchrotron radiation faclities,and solar observation payload.This paper will briefly introduce the above-mentioned results in our team.
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