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集成电路装备光刻机发展前沿与未来挑战

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光刻机是集成电路制造中最为核心的高端装备,在60余年的发展历程中不断挑战人类超精密制造装备的极限,推动着摩尔定律的持续向前和信息时代的飞速发展,对于科技进步、国民经济、国家安全具有极为重要的战略意义。本文阐述了光刻机在集成电路制造装备中的核心地位,介绍了光刻的基本原理,梳理了国际上光刻机从20世纪60年代至今的发展脉络,围绕光刻机三大核心部件分析了光刻机中的关键技术及面临的极限技术挑战。在此基础上,本文展望了未来光刻机的发展趋势和未来方向。
Development frontier and future challenges of lithography machines for integrated circuit manufacturing
The lithography machine is the most core high-end equipment in integrated circuit(IC)manufacturing,and it has challenged the limits of ultra-precision manufacturing equipment continuously over its 60-year development history.It has propelled the constant advancement of Moore's Law and the rapid development of the information age,holding extremely important strategic significance for technological progress,the national economy,and national security.This paper first elucidates the central role of the lithography machine in IC manufacturing equipment,introduces the basic principles of lithography,and traces the development trajectory of lithography machines from the 1960s to the present.The key technologies and severe technical challenges in lithography machines are discussed by focusing on the three core components.Based on these findings,this paper looks forward to future trends and directions in the development of lithography machines.

integrated circuit(IC)lithography machinekey technologydevelopment frontierfuture challenge

胡楚雄、周冉、付宏、张鸣、朱煜

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清华大学机械工程系高端装备界面科学与技术全国重点实验室,北京 100084

清华大学机械工程系精密超精密制造装备及控制北京市重点实验室,北京 100084

集成电路 光刻机 关键技术 发展前沿 未来挑战

国家自然科学基金

51922059

2024

中国科学F辑
中国科学院,国家自然科学基金委员会

中国科学F辑

CSTPCD北大核心
影响因子:1.438
ISSN:1674-5973
年,卷(期):2024.54(1)
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