基于场诱导光致发光猝灭原理的CdSe量子点薄膜的非接触无损原位检测
Non-contact and non-destructive in-situ inspection for CdSe quantum dot film based on the principle of field-induced photoluminescence quenching
龚正 1李文豪 1张树钱 1李俊龙 1苏昊 1黄伟 1王堃 1朱嘉烨 1周雄图 2张永爱 2郭太良 2吴朝兴2
作者信息
- 1. College of Physics and Information Engineering,Fuzhou University,Fuzhou 350108,China
- 2. College of Physics and Information Engineering,Fuzhou University,Fuzhou 350108,China;Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China,Fuzhou 350108,China
- 折叠
摘要
CdSe量子点薄膜作为核心功能层,在各种光电器件中起着关键作用.量子点薄膜的厚度均匀性是决定其整体光电性能的关键因素之一.因此,获取大面积量子点薄膜的厚度分布十分重要.然而,传统的方法难以在不引入额外损伤的情况下快速获得其厚度分布的相关信息.本文提出了一种原位检测CdSe量子点薄膜厚度均匀性的非接触式无损检测方法.这种原位检测方法的原理基于量子点薄膜在高电场作用下的光致发光猝灭现象,通过检测猝灭程度获得量子点薄膜的厚度信息.使用相机分别记录同一量子点薄膜在无电场和有电场情况下的光致发光图像.通过对这两幅图像的亮度分布进行变换,可以直观地得到量子点薄膜阵列的厚度信息.该方法为量子点发光显示器的制造提供了一种新的检测手段.
Abstract
CdSe quantum-dot(QD)film,as the core function layer,plays a key role in various optoelectronic de-vices.The thickness uniformity of QD films is one of the key factors to determine the overall photoelectric performance.Therefore,it is important to obtain the thickness distribution of large-area QD films.However,it is difficult for traditional methods to quickly get the information related to its thickness distribution without introducing additional damage.In this paper,a non-contact and non-destructive inspection method for in-situ detecting the thickness uniformity of CdSe QD film is proposed.The principle behind this in-situ inspection method is that the photoluminescence quenching phenom-enon of the QD film would occur under a high electric field,and the degree of photoluminescence quenching is related to the thickness of the quantum dot films.Photoluminescence images of the same QD film without and with an electric field are recorded by a charge-coupled device camera,respectively.By transforming the brightness distribution of these two images,we can intuitively see the thickness information of the thin film array of QD.The proposed method provides a meaningful inspection for the manufacture of QD based light-emitting display.
关键词
non-contact inspection/non-destructive inspection/field-induced photoluminescence quenching/quantum dotsKey words
non-contact inspection/non-destructive inspection/field-induced photoluminescence quenching/quantum dots引用本文复制引用
出版年
2024