高反射率釉膜及耐环境性能的研究
Study of High Reflectivity Glaze Film and Its Environmental Resistance
马欣彤 1马小鹏 2杨中英2
作者信息
- 1. 西安建筑科技大学华清学院,西安 710043
- 2. 咸阳陶瓷研究设计院有限公司,咸阳 712000
- 折叠
摘要
高反射率釉膜作为背板光伏玻璃上的无机烧结材料,低温制备和高反射率是其关键指标.介绍了经济实用的钠钙硅酸盐熔块(a),部分磷替代硅的磷硅酸盐熔块(b),以及用硼全部替代磷的硼硅酸盐熔块(c),考察了熔块组成与熔融温度和附着力之间的关系.然后将各种熔块和氧化钛分别按1∶1在720 ℃下保持95 s烧成不同系列的反射釉膜,并测定了其反射率和表面粗糙度.结果表明,获得的(c)熔块的反射釉膜,其反射率为73.95％,进一步对(c)熔块的反射釉膜进行退火和冷冻处理以研究其耐环境性能,其反射率几乎未发生变化.
Abstract
As an inorganic sintered material of high reflectivity glaze film applied to rear plane photovoltaic glass,high reflectivity and low temperature preparation are the key indicators.This paper investigated the relationship between the frit composition and the melting temperature and adhesion by considering the economical and practical sodium calcium silicate frit(a),the phosphorus silicate frit that partially replaces silicon with phosphorus(b),and the borosilicate frit that completely replaces phosphorus with boron(c).Then various frits and titanium oxide were fired into different series of reflective glaze films at 11 and kept at 720℃ for 95s,respectively,and their reflectivity and surface roughness were measured.The results show that the reflectivity of the reflective glaze film of©frit is 73.95％.Annealing and freezing treatment of©reflective glaze film were further conducted to study its environmental resistance,and its reflectivity was almost unchanged.
关键词
高反射率釉膜/低温制备/硼硅酸盐熔块/耐环境性/表面粗糙度/背板光伏玻璃Key words
High reflectivity glaze film/Low temperature preparation/Borosilicate frit/Environmental resistance/Surface roughness/Rear panel photovoltaic glass引用本文复制引用
出版年
2024
NETL
NSTL
维普
万方数据