Study on the Properties and Technology of Potassium Sodium Niobate Films Prepared by Non-Alkoxide Method
To prepare high quality K0.5Na0.5NbO3(KNN)films on traditional silicon substrates using a low-cost Nb2O5 as the raw material,a sol-gel method with non-alkoxide method was employed.The typical and modified processes were compared,and the film structure and properties prepared by both processes were analyzed using characterization tools.Films with different coating numbers were also prepared using the modified process,and the effects of coating number on the crystal structure,strain,surface morphology,and electrical properties of KNN films were analyzed using characterization tools and theoretical calculations.The XRD results indicated that the improved process could produce KNN films with a(100)highly preferred orientation on Si substrates.The optimal pyrolysis temperature for the films decreased from 500 ℃ to 150 ℃,leading to enhancements in both the dielectric and ferroelectric properties of the films.Calculations using the Scherrer and SSP formulas indicated that with an increase in the coating numbers,the grain size of the films also increased,and the crystal phase transition occurred from tetragonal to cubic phase.This transition was observed when the coating number was 14 layers,at which point the film strain reached its lowest value.SEM analysis further confirmed that with an increase in the coating layers,the grain size of the films increased,and surface defects were improved.At 18 coating layers,the dielectric constant of the film reached its maximum value of 622.9 at 1 kHz.
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