氮化硅结合碳化硅匣钵在合成锂离子三元正极材料上的应用
Application of Silicon Nitride Bonded Silicon Carbide Saggar in the Synthesis of Lithium Ion Ternary Cathode Materials
王建波 1郑翰 1相宇博 1曹会彦1
作者信息
- 1. 中钢集团洛阳耐火材料研究院有限公司先进耐火材料国家重点实验室,洛阳 471039
- 折叠
摘要
介绍了氮化硅结合碳化硅匣钵在合成高镍三元正极材料NCM811材料服役78次的使用效果、下线原因、理化指标变化、抗侵蚀情况.结果表明:(1)氮化硅结合碳化硅匣钵在NCM811辊道中循环服役78次后,因侧壁裂纹的产生及伸展导致其下线;(2)氮化硅结合碳化硅匣钵在服役过程中展示出良好的抗侵蚀性,表面生成连续、稳定的反应层使得该材质匣钵不会出现掉皮、掉渣现象;(3)反应产物主要为Li4SiO4,反应层厚度为500～700μm,TOF-SIMS检测结果表明Li元素主要富集在距离表面200μm以内区域.
Abstract
This paper introduces the performance of silicon nitride bonded silicon carbide saggar in the synthesis of high nickel ternary cathode material NCM811 over 78 cycles,detailing the reasons for decommissioning,changes in physicochemical indices,and resistance to erosion. The results show that:(1) after 78 cycles of service in the NCM811 roller kiln,the crucible comes down due to the formation and extension of sidewall cracks;(2) the crucible demonstrated good corrosion resistance during the long service. with a continuous and stable reaction layer forming on the surface,preventing spalling and flaking;(3) the main reaction product was Li4SiO4,with a reaction layer thickness of 500～700 μm. TOF-SIMS detection results indicated that the Li element is mainly enriched in the area within 200μm of the surface.
关键词
氮化硅结合碳化硅/匣钵/三元正极材料/抗侵蚀性/TOF-SIMSKey words
Silicon nitride bonded silicon carbide/Saggar/Ternary cathode materials/Corrosion resistance/TOF-SIMS引用本文复制引用
出版年
2024
NETL
NSTL
万方数据