Application of Ion Beam Sputtering Techniques in XPS Depth Profiling
X-ray photoelectron spectroscopy(XPS)is a popular analytical technique in materials science as it can assess the surface chemistry of a broad range of samples.However,the detection depth of the XPS technique is commonly limited to be several nanometers on the surface layer.In order to get the data of compositions under the surface,it is highly anticipant to develop some approaches for XPS to detect chemical information of a material with different depth.Ion beam sputtering has become as an important tool for XPS to study composition gradients in the depth.Based on the new developments of the ion beam sputtering techniques employed in XPS depth profiling in the past three decades,a general overview of the recent advances of the ion etching techniques in XPS depth profiling was provided.This work will provide a valuable reference for the further research and application of the ion sputtering technique.
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