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X射线光电子能谱(XPS)谱图的分峰拟合

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X射线光电子能谱(XPS)分峰拟合是数据结果后处理的常用技术,实际工作中,缺乏XPS分析工作经验的使用者对分峰拟合结果不确定性大.为尽量提高结果的确定度,XPS分峰处理时,需要对样品采集的XPS谱峰进行必要的分析判断、选择正确拟合模型、合理的参量值或范围、选用适当的谱峰背景扣除方法等.在简述分峰拟合基本理论的基础上,通过列举O 1s的自重叠、C 1s与Ru 3d相互重叠、N 1s与GaLM俄歇峰群重叠的分峰典型案例,由浅入深,分析评估了拟合参量对拟合结果的影响,探索分峰拟合技术,努力提高XPS分峰结果确定性.
Curve Fitting of X-ray Photoelectron Spectroscopy(XPS)
X-ray photoelectron spectroscopy(XPS)curve fitting is a commonly used technique for post-processing data results.In practical work,users who lack experience in XPS analysis are confused about the uncertainty of peak fitting results.In order to maximize the certainty of the results,XPS peak processing requires necessary analysis and judgment of the XPS collected from the sample,selection of the correct curve-synthesis model,reasonable parameter values or ranges,and selection of appropriate peak background subtraction methods.On the basis of briefly describing the basic theory of peak fitting,this article analyzes and evaluates the influence of fitting parameters on fitting results,explores peak fitting techniques,and strives to improve the certainty of XPS peak results by listing typical cases of O 1s self-overlap spectra,C 1s and Ru 3d overlap spectra,and N 1s and GaLM Auger peak group overlap spectra.

XPSpeak overlapcurve-synthesis and curve-fittingVoigt-type function

吴璇、吴正龙

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北京师范大学分析测试中心,北京 100875

X射线光电子能谱(XPS) 谱峰重叠 分峰拟合 Voigt函数

2025

中国无机分析化学
北京矿冶研究总院

中国无机分析化学

北大核心
影响因子:1.306
ISSN:2095-1035
年,卷(期):2025.15(1)