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Stability and melting behavior of boron phosphide under high pressure

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Boron phosphide(BP)has gained significant research attention due to its unique photoelectric and mechanical prop-erties.In this work,we investigated the stability of BP under high pressure using x-ray diffraction and scanning electron microscope.The phase diagram of BP was explored in both B-rich and P-rich environments,revealing crucial insight into its behavior at 5.0 GPa.Additionally,we measured the melting curve of BP from 8.0 GPa to 15.0 GPa.Our findings indicate that the stability of BP under high pressure is improved within B-rich and P-rich environments.Furthermore,we report a remarkable observation of melting curve frustration at 10.0 GPa.This study will enhance our understanding of stability of BP under high pressure,shedding light on its potential application in semiconductor,thermal,and light-transmitting devices.

boron phosphidestabilitymelting curvehigh pressure

梁文嘉、向晓君、李倩、梁浩、彭放

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Institute of Atomic and Molecular Physics,Sichuan University,Chengdu 610065,China

School of Mathematics and Physics,Southwest University of Science and Technology,Mianyang 621900,China

Center for High Pressure Science and Technology Advanced Research(HPSTAR),Shanghai 201203,China

国家自然科学基金四川省科技计划

120742732022NSFSC1810

2024

中国物理B(英文版)
中国物理学会和中国科学院物理研究所

中国物理B(英文版)

CSTPCDEI
影响因子:0.995
ISSN:1674-1056
年,卷(期):2024.33(4)
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