首页|Effect of trace oxygen on plasma nitriding of titanium foil
Effect of trace oxygen on plasma nitriding of titanium foil
扫码查看
点击上方二维码区域，可以放大扫码查看
原文链接
NETL
NSTL
万方数据
Titanium nitride films are prepared by plasma enhanced chemical vapor deposition method on titanium foil using N2 as precursor.In order to evaluate the effect of oxygen on the growth of titanium nitride films,a small amount of O2 is introduced into the preparation process.The study indicates that trace O2 addition into the reaction chamber gives rise to significant changes on the color and micro-morphology of the foil,featuring dense and long nano-wires.The as-synthesized nanostructures are characterized by various methods and identified as TiN,Ti2N,and TiO2 respectively.Moreover,the experiment results show that oxide nanowire has a high degree of crystallinity and the nitrides present specific orientation relationships with the titanium matrix.
nitrideoxidenanostructurecrystallineplasma-enhanced chemical vapor deposition system(PECVD)
周海涛、熊希雅、马可欣、罗炳威、罗飞、申承民
展开 >
Beijing Institute of Aeronautical Materials,Aero Engine Corporation of China,Beijing 100095,China
Beijing National Laboratory of Condensed Matter Physics,Institute of Physics,Chinese Academy of Sciences,Beijing 100190,China
Innovation Funding of Beijing Institute of Aeronautical Materials
NETL
NSTL
万方数据
