中国物理B(英文版)2024,Vol.33Issue(7) :630-636.DOI:10.1088/1674-1056/ad3dd7

Unveiling the in-plane anisotropic dielectric waveguide modes inα-MoO3 flakes

廖莹 陈佳宁
中国物理B(英文版)2024,Vol.33Issue(7) :630-636.DOI:10.1088/1674-1056/ad3dd7

Unveiling the in-plane anisotropic dielectric waveguide modes inα-MoO3 flakes

廖莹 1陈佳宁2
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作者信息

  • 1. Beijing National Laboratory for Condensed Matter Physics,Institute of Physics,Chinese Academy of Sciences,Beijing 100190,China;School of Physical Sciences,University of Chinese Academy of Sciences,Beijing 100049,China
  • 2. Beijing National Laboratory for Condensed Matter Physics,Institute of Physics,Chinese Academy of Sciences,Beijing 100190,China;School of Physical Sciences,University of Chinese Academy of Sciences,Beijing 100049,China;Songshan Lake Materials Laboratory,Dongguan 523808,China
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Abstract

The unique in-plane and out-of-plane anisotropy of α-MoO3 has attracted considerable interest with regard to poten-tial optoelectronic applications.However,most research has focused on the mid-infrared spectrum,leaving its properties and applications in the visible and near-infrared light spectrum less explored.This study advances the understanding of waveguiding properties of α-MoO3 by near-field imaging of the waveguide modes along the[100]and[001]directions ofα-MoO3 flakes at 633 nm and 785 nm.We investigate the effects of flake thickness and documented the modes'dispersion relationships,which is crucial for tailoring the optical responses of α-MoO3 in device applications.Our findings enhance the field of research into α-MoO3,highlighting its utility in fabricating next-generation optoelectronic devices due to its unique optically anisotropic waveguide.

Key words

waveguide/anisotropic materials/near-field imaging/van der Waals materials

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基金项目

National Key Research and Development Program of China(2022YFA1203500)

Strategic Priority Research Program of the Chinese Academy of Sciences(XDB30000000)

CAS Youth Interdisciplinary Team()

出版年

2024
中国物理B(英文版)
中国物理学会和中国科学院物理研究所

中国物理B(英文版)

CSTPCDEI
影响因子:0.995
ISSN:1674-1056
参考文献量43
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